Can someone explain the total probability for the photoemmission process? Explain what each equation does and how can you change its probability?
I am not particularly sure about the statement I made at the bottom.
for insitance, increasing the density of state would increase the creation of photoelectron as there is more electron.
maybe, Increasing the photon energy, this would increase the kintetic energy of electron with high mean free path. But high energy photon would penetrate deeper into the solid.
Maybe chaning the angle of photon. if we could reduce the angle between the electron ejection and normal to the surface, it would have greater momentum. This would increase photoelectron into vaccum probability?
Three steps process or model The total probability for the photoemission process can be written as, P(EK,hv)T(EK,hv)D(EK). Probability of photoexcitation of an electron inside the solid. ∑f,j∣⟨f∣A⋅pj∣i⟩∣2δ(Ef(N)−Ei(N)−hv),Ef(N)=EK+ϕ+Ef(N−1) - Travel of photoelectron to the sample surface T(EK,hv)=1+α(hv)λmp(EK)α(hv)λmp(EK)≃α(hv)λmp(EK). - Emission of the photoelectron into vacuum D(EK)=21(1−EK+V0V0).