Final answer:
The use of photoresist technology in the construction of copper "wiring" in an integrated circuit is true. It is crucial for the photolithography process that creates the intricate circuit patterns on a silicon substrate, allowing for billions of transistors to be placed on a single chip.
Step-by-step explanation:
The statement that photoresist technology is also used to construct the copper "wiring" in an integrated circuit is true. Photoresists are light-sensitive materials used in a process called photolithography which is essential for creating the intricate patterns of an integrated circuit, including its copper interconnections. In the process of chip fabrication, a substrate, often made of silicon, is coated with a photoresist. This photoresist is then exposed to ultraviolet light through a mask which patterns the desired circuit design. Once developed, the exposed or unexposed areas of the photoresist are removed, and the underlying substrate can then be etched to create recessed areas for the copper wiring. This is followed by the deposition of copper and subsequent planarization, leaving the copper only in the desired wiring patterns. The use of photoresist technology allows for the precision necessary to fit billions of transistors into a chip the size of your thumbnail, integral for modern computing devices.