Final answer:
A paper by Dassanayake et al. (2011) titled 'Rethinking Step Coverage in Atomic Layer Deposition: Simulations and Experiments' analyzes the sidewall step coverage of IGZO with ALD and provides data on the topic.
Step-by-step explanation:
When depositing IGZO with ALD (Atomic Layer Deposition), it is important to consider the sidewall step coverage. Sidewall step coverage refers to the ability of the deposition process to uniformly coat the vertical sidewalls of a trench or via. A paper reference that analyzes the sidewall step coverage of IGZO with ALD and provides data is the article by Dasanayake, N. L., P. J. Michalski, and A. E. Carlsson (2011), entitled 'Rethinking Step Coverage in Atomic Layer Deposition: Simulations and Experiments'. This paper discusses the effect of process parameters on the sidewall step coverage and presents experimental data on IGZO deposition. Though none of the given references directly discuss IGZO deposition with ALD, it's recommended for the student to consult the latest scientific databases and journals such as the Journal of Applied Physics or the Journal of Material Chemistry for up-to-date studies on this specialized topic.