Question

Which of the following materials is typically deposited using Chemical Vapor Deposition? Select one:

a. Epitaxial silicon
b. Silicon nitride
c. All of these
d. Polysilicon
e. Silicon dioxide

Answer 1

The correct answer is c. All of these, as Chemical Vapor Deposition is a widely-used method to deposit a variety of materials including epitaxial silicon, silicon nitride, polysilicon, and silicon dioxide on substrates in the semiconductor industry.

Step-by-step explanation:

The question asks which of the following materials is typically deposited using Chemical Vapor Deposition (CVD):

• Epitaxial silicon
• Silicon nitride
• Polysilicon
• Silicon dioxide

The correct answer is c. All of these. Chemical Vapor Deposition is a versatile technique widely used in the semiconductor industry to deposit thin films. Various materials such as epitaxial silicon, silicon nitride, polysilicon, and silicon dioxide can be deposited using CVD. This process involves the chemical reactions of gaseous precursors on a heated substrate to form a solid material with high purity and conformity.