Final answer:
Chemical Vapor Deposition (CVD) is used to create high-performance materials in very thin layers, such as sodium oxide, cadmium sulfide, and aluminum carbide, which are key to applications like anti-reflective coatings. Understanding thin-film interference through experiment highlights the precise control over film thickness CVD provides, vital for tailoring material properties.
Step-by-step explanation:
The student has asked to make a list of materials that can be deposited as thin layers by Chemical Vapor Deposition (CVD). CVD is a chemical process used to produce high quality, high-performance, solid materials, often under vacuum. Materials that can be deposited by CVD include, but are not limited to, sodium oxide (Na₂O), cadmium sulfide (CdS), magnesium nitride (Mg₃N₂), calcium phosphide (Ca₃P₂), and aluminum carbide (Al₄C₃). These materials are deposited in very thin layers, often at the molecular level, and can have applications such as anti-reflection coatings and optical filters.
The thinness of these films is crucial for applications like non-reflective coatings found in car windows and sunglasses, where they lead to destructive interference of unwanted wavelengths of light, while allowing other wavelengths to transmit or reflect, depending on the design of the thin film. A properly designed experiment to observe thin-film interference could relate the observed colors of visible light to their corresponding wavelengths, emphasizing the extremely thin nature of these films.