Question

A silicon dioxide film formed on the surface of a silicon wafer by thermal oxidation has a thickness that is ____

(A) greater than, (B) less than, or (C) the same as the layer of substrate silicon used to form it.

Answer 1

less thickness

Step-by-step explanation:

Thermal oxidation is a process where only the surface atoms react and are converted into the silicon dioxide, so unless you have a layer of silicon wafer of a one atom thickness, the thickness of the silicon dioxide will always be thinner than the silicon wafer.